Abstract
Heteroepitaxial ternary CoxY1−xSi1.7 silicide (x>0.27) has been formed by Co implantation into YSi1.7/Si(111). The formation of this compound is confirmed by an x-ray symmetric θ–2θ scan. However, the θ–2θ scan alone cannot discriminate between the possible phases (tetragonal, orthorhombic, or hexagonal) of this compound. On the other hand, Rutherford backscattering (RBS)/channeling confirms that this silicide is hexagonal and that its azimuthal orientation is CoYSi1.7[0001]//Si[111] and CoYSi1.7{112̄0}//Si{110}. In addition, the lattice constants of the ternary silicide aepi=0.3989 nm (which means that the lattice mismatch is >3.9% relative to the Si substrate) and cepi=0.3982 nm have been determined by RBS/channeling and x-ray diffraction.
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