Abstract
Microstereolithography is a microfabrication technology done in a layer-by-layer fashion. It is useful to fabricate a microstructure with both a high aspect ratio and a complex shape. Projection microstereolithography is suitable for microstructure array fabrication due to the fast process time using patterned light irradiation. However, nonuniform light intensity on the resin surface deteriorates the fabrication precision. This research proposes the cross-section segmentation for uniform exposure energy on the resin surface. Each subsection consisting of a cross-section is separately converted into an image file. The estimated exposure time of each subsection is stored in a text file and used during the fabrication. Finally, several microstructure arrays are fabricated to verify this method.
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