Abstract
In this paper, the results of the recent studies on application of lower critical solution temperature (LCST) phenomena of polymer solutions to the surface modification of flat and spherical substrates are reported. It was found that a controlled polymer deposition can be achieved upon prevailing of the LCST, a peculiar surface topology of polymer coating and particles those remarkably effective in stabilizing pigment dispersiions. Second, the finding is that the temperature induces polymer deposition as the coprecipitation of a finely dispersed component on the substrate surface. That goes along with the polymer deposition after exceeding of the LCST which in turn allows for the tailored surface modification of pigments in that particulate additiives can be incorporated into the surface modifying coating.
Highlights
The coating of the substrate with an organic polyymer film is often required for application technolo-g gy reasons
Si-wafers were used as sub-s strates for film deposition and surface topology stud-i ies by atomic force microscopy (AFM), and particle surface modification was investigated with comme-r rcially available pigments
In order to further explore the effect of the po-l lymer concentration on the change in the surface topology of lower critical solution temperature (LCST) deposited P(EO-b-PO-b-EO), firrst the phase diagram was established
Summary
The coating of the substrate with an organic polyymer film is often required for application technolo-g gy reasons. The polymer depossition on a substrate upon exceeding the lower criticcal solution temperature (LCST) or by cooling beyoond the upper critical solution temperature (UCST) opens interesting perspectives for the fabrication of coatings with novel surface properties [1,2,3,4]. Si-wafers were used as sub-s strates for film deposition and surface topology stud-i ies by atomic force microscopy (AFM), and particle surface modification was investigated with comme-r rcially available pigments.
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