Abstract
The adsorption behavior of O2 on Si(001)2×1 at 100 K sample temperature has been studied by measuring the intensity ratio of the KL1L1 and KL2,3L2,3 O Auger transitions α as a function of the fractional oxygen coverage in an attempt to solve a longstanding discussion whether this reaction also involves molecular chemisorption. Recent cluster calculations provided evidence that the bond distance between Si and O and between the two oxygen atoms in the O2 molecule is a key parameter affecting the magnitude of α. By referring to the room temperature adsorption of N2O on the same surface we have found evidence for the coadsorption of a metastable molecular oxygen species at advanced adsorption stages, a result which is essentially in agreement with previous experimental predictions and theoretical calculations.
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Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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