Abstract
Cr–C–W coatings were deposited from organo-aqueous solutions containing dimethylformamide by electrolysis. The obtained deposits were studied by the modern physical methods: X-ray photoelectron spectroscopy (XPS), X-ray diffraction (XRD), time-of-flight secondary ion mass spectrometry (SIMS), and inductively coupled plasma atomic emission spectroscopy (ICP-AES). The corrosion of Cr–C–W electrolytic deposits was studied in the solutions of sulfuric acid, sodium chloride, and hydrochloric acid. Cr–C–W coatings demonstrated higher corrosion resistance compared with chromium deposits. It was suggested that the decrease of the corrosion rate is caused by the formation of the thin layer enriched with tungsten and its oxides at the surface of the Cr–C–W alloy. This assumption was confirmed by both XPS and SIMS.
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