Abstract
Metal plasma ion implantation (MPII) was successfully developed for improving wear, corrosion, and physical properties of engineering materials. In this study, CrN films were deposited by a cathodic arc evaporation (CAE) process, and Nb ions were implanted into the CrN films at 150 keV and (1–2)×10 17 ions/cm 2 using a metal plasma ion implantation apparatus. The electrochemical behavior of the Nb-implanted CrN films in a 3.5 wt.% NaCl solution was investigated by the potentiodynamic polarization measurement and electrochemical impedance spectroscopy (EIS). The corrosion resistance of Nb-implanted CrN was improved by the formation of amorphous and chemically inert Cr–Nb–N phases in the ion-implanted layer, which leads to the increase of polarization resistances and the decrease of capacitances in the EIS analysis. At the dose of 1×10 17 ions/cm 2, the Nb-implanted CrN possesses the best corrosion resistance due to the highest polarization resistance (2.53×10 6 Ω/cm 2) and the lowest capacitance (1.4×10 −5 F/cm 2). Results of this study demonstrate the potential of metal plasma ion implantation in improving the corrosion resistance of the CrN coating without hampering its mechanical properties.
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