Correlation of Void Formation with the Reduction of Carrier Activation and Anomalous Dopant Diffusion in Si-Implanted GaAs

Abstract

AbstractWe report the study of high-dose Si-implanted GaAs containing doses ranging from 1×1014 to 1×1015 cm-2 and with subsequent anneals at 850°C for 1 hour. At doses ≥ 3×1014 cm-2, a severe reduction of carrier concentration and anomalous Si diffusion are observed in the near-surface region. In the same region, small, near-spherical voids are found by transmission electron microscopy. In contrast, for samples implanted with doses ≤ 1×1014 cm-2, voids are not found, and both normal carrier activation and Si diffusion profiles are observed. The concurrent onset of these three phenomena in the same region in high-dose samples leads us to conclude that the severe reduction of carrier concentration and anomalous Si diffusion are attributable to the formation of voids.