Abstract
Nanocrystalline thin films of zinc oxide (ZnO) of thickness 100 nm are deposited using electron beam (e-beam) evaporation technique. These films are irradiated using 75 MeV Au ion beam at two different fluences namely 1 × 1011 ions cm−2 and 5 × 1011 ions cm−2. GAXRD and Raman spectroscopic studies indicate stability of nanocrystalline phases of ZnO against irradiation. Surface morphology studies using atomic force microscopy show evolution of nanosized hillocks at the surface of the irradiated films. Nano-hillock formation is also confirmed by a blue shift of the UV–visible absorption edge. The electrical conductivity of the films is found to decreases due to irradiation induced morphological modifications. Ion irradiation technique has been effectively used for controlled modification of nanocrystalline ZnO thin film surface. The preliminary studies carried out clearly indicate that the irradiated films are suitable for various applications.
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