Abstract
The constriction resistance and the current flow pattern are calculated analytically in a vertical thin film contact in which the thin film base is an equipotential surface. Both Cartesian and cylindrical thin film contacts are studied. The resistivities and the geometric dimensions in the individual contact members may assume arbitrary values. General scaling laws are constructed for the constriction resistance for arbitrary resistivity ratios and geometric aspect ratios. The analytic solutions are validated using a simulation code. Current crowding at the edges is displayed. In the limit of small film thickness, we show that current crowding in the vertical contact is far less serious than the current crowding in the horizontal contact. The data show that the normalized constriction resistance depends predominantly on the geometry of the thin film, but is relatively insensitive to the height and to the resistivity of the member with which the thin film is in contact.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
