Abstract
A generalized small-signal computer simulation of double avalanche region (DAR) n +-p-v-n-p + Si and InP IMPATT diodes has been carried out for different frequencies and current densities taking both drift and diffusion of charge carriers into account. The simulation results show that both symmetrically and asymmetrically doped devices based on Si and InP exhibit discrete negative conductance frequency bands separated by positive conductance frequency bands. The magnitudes of both negative conductance and negative resistance of InP devices are larger than those of Si devices in case of symmetrical and asymmetrical diodes. Further, the negative resistance profiles in the depletion layer of these diodes exhibit a single peak in the middle of the drift layer in contrast to double peaks in double drift region diodes.
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