Abstract
Examination was made of the optimum performance of thermal ionization, fieldionization and electron ionization sources, using permalloy (Ni81Fe19)and aluminium as source materials. Discussion is made of the possible use of theseto give direct deposition sources, for low-cost nanoscale device production.Fabrication of field emitter tips using focused ion beam milling was used to try toenhance the ion emission current of field ionization sources. Electron ionizationproduced the largest ion current, but field ionization gave enhanced stability.
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