Abstract
YBa 2Cu 3O 7−x films have been deposited by photo-assisted MOCVD at commercially viable rates on both single crystal oxide substrates and atomically textured metallic substrates. CeO 2 and YSZ buffer layers have also been developed by photo-assisted MOCVD for deposition on metallic substrates at rates approaching 1 μm/min. The resulting buffer layers show good duplicate of the moderate order of the underlying metallic substrates, and the subsequent YBCO layers show similar moderate atomic order with resulting J c ∼ 5 × 10 5 A/cm 2.
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