Abstract

This letter presents a new Si CMOS linear-mode avalanche photodiode (APD) based on an electric field distribution formed by field-line crowding. In this structure, a spherical avalanching electric field is enforced by field-line crowding due to the curvature of the half-sphere cathode (n-well). The electric field extends radially and, therefore, the entire low-doped epitaxial layer serves as charge collection zone. This APD can provide high responsivity and bandwidth due to its thick absorption zone and drift-based carrier transport. Measurements using a 675 nm laser source at 200 nW optical power show a maximum bandwidth of 1.6 GHz while the responsivity is 32 A/W. In addition, a maximum responsivity of 3.05 <inline-formula xmlns:mml="http://www.w3.org/1998/Math/MathML" xmlns:xlink="http://www.w3.org/1999/xlink"> <tex-math notation="LaTeX">$\times \,\,10^{3}$ </tex-math></inline-formula> A/W at 5 nW optical power is achieved. Due to the high avalanche gain, large bandwidth, and CMOS compatibility without any process modification, this APD is a promising optical detector for many applications.

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