Abstract
TiWC thin films were deposited on stainless steel substrates (440C) by chemical vapor deposition (CVD) in a horizontal hot-wall reactor from a TiCl 4W(CO) 6CH 4H 2Ar gaseous mixture, at 1323 K and at pressures ranging from 0.13 to 20.00 kPa. The structures of the TiWC thin films were characterized using X-ray diffraction (XRD). The lattice constant of the TiWC films shifts from that of TiC to WC 1− x with increasing W concentration in the thin films. A morphological analysis was carried out using scanning electron microscopy (SEM). It was found that the surface morphology varied with the W concentration and total flow. Compositional studies and binding characteristics in the TiWC films were investigated by X-ray photoelectron spectroscopy (XPS). The associated hardness measured by nano-indentation ranged from 23 to 32 GPa. The studies of transmission electron microscopy (TEM) and selected area diffraction (SAD) reveal the detailed microstructure of the TiWC thin films and the presence of a WC phase.
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