Abstract
The authors have developed metallic ion beams in the energy range of a few keV to a few MeV using a low-energy ion-beam facility (LEIBF) consisting of a 10GHz all-permanent-magnet electron cyclotron resonance (ECR) ion source placed on a high-voltage (200kV) platform. The metallic vapors were achieved by plasma sputtering, using a micro-oven and volatile compounds to produce multiply charged ECR plasma. The ions were then extracted from the plasma and their energy and momentum were analyzed using a high-resolution dipole magnet. Charge-state distributions (CSDs) of three metallic ECR plasmas (Cu, Ni, and Sn) produced by different techniques are presented to help in using low-energy metallic ions for implantation. We present the CSD studies of metallic ECR plasma and highlight the physics of the process involved.
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Schedule a callMore From: Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films
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