Abstract
AbstractTransient photoconductivity measurements in a-Si:H at different n- and p-doping level point to decay kinetics which strongly depend on the doping level and excitation densities. In undoped a-Si:H excess charge carriers decay mainly by a transition between electrons and holes at their respective mobility edges. The generation of hole traps by n-doping quenches this decay channel and transitions between localized states in the bandgap play an important role in charge carrier kinetics. In p-doped material the availability of a large density of mobile holes and positively charged recombination centers increases the electron decay drastically.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.