Abstract
The first stages of copper growth on amorphous carbon and polycrystalline silver substrates by high rate magnetron-enhanced sputtering and the first stages of nickel electrodeposition on polycrystalline silver substrates have been investigated by Auger electron spectroscopy because direct observation by scanning electron microscopy or transmission electron microscopy was not possible. The deposit-to-substrate Auger peak-to-peak intensity ratio curves vs. the quantity of deposited matter have been shown to be characteristic of the growth mode. The method allowed us to distinguish between the island growth mode, the layer-by-layer growth mode, and the coalescence stage. When an island growth mode was observed (on carbon substrates in copper sputtering and on silver substrates in nickel electrodeposition) the approximate mean cluster size and mean cluster surface density have been calculated from the Auger results.
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