Abstract
ABSTRACT The synthesis and characterization of the photoresist polymer for using as spacer in LCD panel were investigated. The poly(methacrylate-co-styrene) (PMHS) and NCO-terminated prepolymer were synthesized using radical initiator and catalyst, respectively, and in-situ, the poly(urethane-(methacrylate-co-styrene)) (PMHSU) was prepared with the PMHS and NCO-terminated prepolymer. The PMHS and the PMHSU were characterized by FT-IR, 1H-NMR and thermal properties were investigated by thermogravimetric analysis (TGA) and differential scanning calorimetry (DSC). After the films were prepared by the sequential processes of spin-coating propylene glycol monoethyl ether acetate solution containing PMHSU, multifunctional monomer, and photoinitiator, pre-baking, UV-exposing and post-baking, the compression recovery of the films was investigated by nano-indenter. The negative patterns of the PMHSU were obtained by developing.
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