Abstract
The effects of plating conditions were investigated on the composition of Cr-Ni alloys electrodeposited on brass substrates from a chromium(III)-nickel(II) bath at 30oC. At 10 A/dm2, Ni-rich deposits were obtained, whereas and at 40 A/dm2, Cr-rich deposits were formed. Hence, pulsed-current electroplating was used to develop Cr- and Ni-rich multi- layers with a thickness modulation of tens of nanometers. Microstructures of Cr-Ni multilayers were investigated by transmission electron microscopy (TEM) and electron diffraction.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
