Abstract
A novel transducer for megasonic cleaning of photomasks presents an approach that differs from previous configurations, and appears to have unique features for cleaning while minimizing damage. As the cleaning and damage processes are determined by the presence of cavitation, a thorough acoustic analysis was performed on the device, by using a calibrated hydrophone scanned at the photomask location, and a quartz photomask with embedded sensors.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
