Abstract
Heteroepitaxial Nd0.32Y0.68Si1.7 layers with good crystalline quality (χmin of Nd and Y is 3.5% and 4.3%, respectively) have been prepared by high dose 65 keV Y and 80 keV Nd implantation into a Si(111) substrate using channeled ion beam synthesis. Although the disilicide of Nd only exists in a tetragonal or an orthorhombic phase which cannot be grown epitaxially on a Si(111) substrate, our results show that the addition of Y to the Nd–Si system forces the latter into a hexagonal structure. Rutherford backscattering/channeling and x-ray diffraction studies reveal that the lattice parameters of the Nd0.32Y0.68Si1.7 epilayer are aepi=0.3915 nm and cepi=0.4152 nm and that the epilayer is stable up to 950 °C. Annealing at 1000 °C results in partial transformation into other unidentified phases.
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