Abstract
In this study, the radio-frequency (RF) sputtering of cerium oxide was explored to determine the effect of the operating conditions on the film growth of cerium oxide on glass, and silicon substrates. The process variables were sputtering time, input power and R (Ar/O2) ratio. In order to better understand the influence of process variables on the growth mechanism, the grain size and film thickness of cerium oxides were explored by using SEM, XRD, and α-step processes. From the results of SEM photographs, the grains of cerium oxides could be evaluated by using an imaging analysis technique. On the other hand, from the XRD data, with the aid of Scherrer’s equation, the crystalline sizes of cerium oxide crystals could be determined. The grain size was higher than the primary size, indicating the agglomeration of cerium oxide crystals. In addition, the effects of parameters on crystal size and film thickness are discussed herein following regression.
Highlights
There are several deposition methods, such as evaporation, chemical vapor deposition (CVD), and sputtering, that are used to deposit thin films [1]-[6]
full width at half maximum (FWHM) of the CeO2 (111) diffraction peaks and corresponding Bragg diffraction angles (2θ) for silicon substrates under different sputtering conditions can be used to evaluate the crystal size of the films based on the X-ray diffraction (XRD) results, we used Scherrer’s equation: dp
The reverse effect was more significant for Series S3. These results indicated that deposition time, Ar/O2 ratio, and sputtering power had obvious effects on the crystalline structure of cerium oxide
Summary
There are several deposition methods, such as evaporation, chemical vapor deposition (CVD), and sputtering, that are used to deposit thin films [1]-[6]. To obtain high quality CeO2 film by RF sputtering on substrates, such as PC, glass, or silicone plates, it is important to accurately control key parameters, such as RF power, deposition pressure, and gas flux [19] [20] [21]. Determining how to control the particle size of CeO2 and the film thickness for sputtering is essential in the application of oxygen gas sensors. Cerium oxide can function as a catalyst, fuel cell, hydrogen production, oxygen sensor, and anticorrosion The texture of these thin films can affect the mechanical, electronic, and corrosion properties. We deposited CeO2 films by RF magnetron sputtering onto two substrates at room temperature in order to investigate the effects of the process variables on the structural, optical, and particle size properties of the deposited films. In order to characterize the properties of CeO2 film on the substrates, the films were examined by FESEM, XRD, and α-step machines
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