Abstract
Metastable phase formations were studied in Au/a-Si thin film multilayers using differential scanning calorimetry and x-ray diffraction. Two nonequilibrium crystalline silicides were found to form below 500 K. Each phase formed by a different mechanism, and the competing growth of the two phases over the temperature range of 375 to 500 K, was found to depend greatly on thickness and grain size in the Au layers. At higher temperatures (500–600 K), these metastable phases decomposed and the a-Si crystallized by metal-induced crystallization to yield a phase mixture of Au and x-Si. The enthalpy of crystallization of a-Si was measured from the calorimetry data to be −12.1±1.2 kJ/mol.
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
