Abstract
Native oxide technology is used to fabricate long wavelength (λ∼1.3 μm) InAlAs-InP-InGaAsP quantum well heterostructure laser diodes with a buried oxide undercutting and constricting the ridge-waveguide active region. The buried native oxide of InAlAs constricts the current and reduces edge and surface losses. Data are presented showing threshold currents as low as ∼140 mA for ∼13-μm-wide stripes (L∼750 μm), with maximum continuous wave output powers as high as ∼225 mW/facet and external differential quantum efficiencies up to 67% (300 K, uncoated facets).
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