Abstract
Ferroelectric B3.15Nd0.85Ti3O12 (BNdT) thin films were deposited on SrTiO3/Si, HfO2/Si and Si substrates respectively by sol-gel process. The electrical properties were studied for Metal-Ferroelectric-Semiconductor (MFS) and Metal-Ferroelectric-Insulator-Semiconductor (MFIS) capacitors. The MFIS structure exhibited well clockwise capacitance-voltage hysteresis loops due to the ferroelectric polarization of BNdT thin film achieved. The maximum memory windows were 3.2 V and 4.7 V, respectively for BNdT deposited on SrTiO3 and on HfO2 buffer layers. In comparison, the memory window of the thin film on Si substrate was 2.8 V. The leakage current of the structure with a buffer layer was much lower than that without a buffer layer. The leakage current of the thin film deposited on SrTiO3/Si was of the order of 10-9-10-8 A/cm2. The electrical properties of the MFIS structures were improved. The results show that the BNdT based MFIS capacitor is a promising candidate for ferroelectric field effect transistor (FeFET).
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