Abstract
A novel platform suitable for fundamental investigations of light propagation through micro- and nano-structures will be discussed. This platform is based on a dielectric multilayer that sustains Bloch surface waves (BSWs). BSWs are electromagnetic surface waves excited at the interface between a truncated periodic dielectric multilayer and a surrounding media. The modification of the top surface to customize a complete 2D micro-system can be produced using e-beam writing, optical lithography or other patterning techniques. The results obtained confirm the possibility of developing a robust multilayer platform that would pave the way for integration of photonic components in photonic chips using standard wafer-scale production.
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