Bilayer Markov Random Field Method for Detecting Defects in Patterned Fabric

Abstract

Existing block-level defect detection method in patterned fabric causes a large number of false detections due to the lack of edge information. To solve this problem, in this paper, we propose a bilayer Markov random field (BMRF) method for inspecting defects in patterned fabric. First, the proposed method reduces samples of the original fabric image to obtain the constraint layer, which can locate the defective block roughly. Second, we interpolate samples into the image to supplement the local information to improve and optimize the imperfect boundary, to obtain a more detailed data layer. Moreover, this paper proposes a new potential function, which considers the differential characteristics of the image blocks in the same layer and the transition probability between different layers. Finally, this paper utilizes a parameter estimation method based on the expectation maximization to solve the parameters of the BMRF method. The proposed BMRF method is evaluated on databases of star-, box- and dot-patterned fabrics. By comparing the resultant and ground-truth images, the recall rate of the proposed method in the three patterned fabrics is 95.32%, 89.29% and 93.28%, respectively, which is comparable to the existing methods.