Abstract

Due to aggressive technology downscaling, process and runtime variations have a strong impact on the correct functionality in the field as well as manufacturing yield. The assessment of the yield and failure rate is extremely crucial for design optimization. The common practice is to use Monte Carlo simulations in order to account for device variations and estimate failure rate. However, Monte Carlo methods are infeasible for estimating rare events such as high sigma failure rates, and hence, various importance sampling methods have been proposed. In this paper, we present an efficient importance sampling approach based on Bayesian optimization. Its advantages include constant complexity independent of the dimensions of design space, the potential to find the global extrema, and higher trustworthiness of the estimated failure rate. We evaluated the approach on a 6T SRAM cell based on a 28nm FDSOI process. The results show significant speedup and more than two orders of magnitude better accuracy in failure rate estimation, compared to the best state-of-the-art technique.

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