Band bending and band alignment at HfO2/HfSixOy/Si interfaces

Abstract

Band bending and band alignment at HfO2/SiO2/Si and HfO2/Hf/SiO2/Si interfaces were investigated using X-ray photoelectron spectroscopy. After Hf–metal pre-deposition, a 0.55eV band bending in Si and a 1.80eV binding energy decrease for Hf 4f and O 1s of HfO2 were observed. This was attributed to the introduction of negative space charges at interface by Hf pre-deposition. Band bending decrease and synchronous binding energy increases of O 1s and Hf 4f for HfO2 were observed during initial Ar+ sputtering of the Hf pre-deposited sample. This was interpreted through the neutralization of negative space charges by sputtering-induced oxygen vacancies.