Abstract
Noble metal nanoparticles dispersed on dielectric substrates have been extensively studied to apply to advanced optical devices based on surface plasmon resonance (SPR). The SPR frequency could be tuned by morphology and distribution of Au nanoparticles. Therefore, in order to establish a method to control the morphology and distribution of nanoparticles, it is important to understand fully mechanism of nanoparticles formation. In this study, to investigate the mechanism of the Au nanoparticles formation on Au thin film/SiO 2 glass substrate during quantum beam irradiation, we carried out in-situ experiments using multi quantum beam high-voltage electron microscope (MB-HVEM). TEM samples of SiO 2 glass substrates were prepared by a back thinning method using a precision ion polishing system (PIPS; JEOL AT-12310). A thin Au film was deposited on the front surface of TEM samples at room temperature by using a vacuum evaporator. For the in-situ observation, MB-HVEM (JEOL, JEM-ARM1300) equipped with three kinds of laser was used. In this study, the laser was irradiated to the surface of the Au thin film at an angle of 44 degree with a linearly polarized Nd-YAG nanosecond-pulsed laser (wavelength: 532 nm, average laser energy density of per pulse: 50 mJ/cm 2 , pulse repetition rate: 2Hz). In situ observation was recorded by a CCD camera at 10 frames per second.
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