Abstract
This paper describes the use of audio frequency generated plasmas for advanced etching processes. Following results have been achieved : 1.- Audio frequencies are suited for good definition etching processes.2.- Distribution of the power over multiple electrodes results in low damage processing.3.- Magnetic confinement of audio frequency plasmas can easily be achieved using DC-powered solenoids to generate the magnetic field.4.- High rate silicon nitride, polysilicon and polymer etching can be performed using clean fluorine chemistries.
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