Abstract
ABSTRACTThe influence of surface roughness on the initial V-grooved substrate on the interface uniformity of V-shaped AIGaAs/GaAs quantum wires (QWRs) is investigated by direct atomic force microscopy observation of V-groove surface. We found that roughness on the initial V-grooved substrate induced during V-groove preparation processes can severely affect the interface uniformity of QWRs grown on it. We also found that roughness on the initial substrate can be greatly reduced by a simple etching treatment using a NH4OH:H2O2:H2O=1:3:50 solution, and this resulted in significant improvement of QWR interface quality.
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