Abstract
The growth mechanism of octadecyltrichlorosilane (OTS) on SrTiO 3 substrates has been investigated by wettability and force microscopy measurements. The films were formed by the self-assembly technique. It was found that growth proceeded via two types of islands: large `fractal-like' islands and smaller circular patches of molecules. The patches grow by attachment of monomers and coalescence with other islands. The overall growth mode obeyed first order Langmuir kinetics and is found to be similar to the growth of alkylsiloxanes on SiO 2 and mica. The difference between growth on SrTiO 3 and SrTiO 3:Nb is that the growth rate is slower on the latter substrate.
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