Abstract
Atomic interdiffusion in compositionally modulated amorphous TM-Zr (TM = Fe, Co, Ni or Cu) alloy films were studied by mean of in-situ X-ray diffraction measurements during successive isothermal annealing. The results were analyzed as free volume-dependent atomic diffusion with activation energy of atomic diffusion, Q D (8−10×10 4 J/ mol) and that of the free volume annihilation, Q A (4−6×10 4 J/ mol).
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