Abstract
Abstract The deposition of sub-stoichiometric silicon rich oxide (SRO) is the first step to obtain well ordered silicon Quantum Dots (QDs) in a dielectric matrix. This structure is used also for third generation photovoltaic devices operating in a tandem architecture. A precise control and assessment of the stoichiometry of these films is crucial to tune the electrical and optical properties of the device. In this paper we discuss two optical techniques to assess the composition of such films and we compare their results.
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