Abstract
The effects of step changes in the concentration of HCO3−, Cl− and SO42− on copper pitting propagation in simulated potable waters were investigated. HCO3− and Cl− additions were found to stifle propagation of previously established pits. Raising the applied potential could restart pit growth temporarily. In contrast, SO42− was able to reactivate stifled pits without a potential increase. Stifling of pit growth upon HCO3− and Cl− additions was attributed to the formation of highly resistive malachite and copper chloride layers. The detrimental effect of SO42− was attributed to the chemical dissolution of the resistive copper chloride layer and the formation of a porous brochantite pit cap.
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