Abstract
X-ray interference lithography (XIL) was employed in combination with electrodeposition to fabricate arrays of nanoscale nickel dots which are uniform over 40μm and have periods down to 71nm. Using extreme-ultraviolet light, XIL has the potential to produce magnetic dot arrays over large areas with periods well below 50nm, and down to a theoretical limit of 6.5nm for a 13nm x-ray wavelength. In the nickel dot arrays, we observed the effect of interdot magnetic stray field interactions. Measuring the hysteresis loops using the magneto-optical Kerr effect, a double switching via the vortex state was observed in the nickel dots with diameters down to 44nm and large dot separations. As the dot separations are reduced to below around 50nm a single switching, occurring by collective rotation of the magnetic spins, is favored due to interdot magnetic stray field interactions. This results in magnetic flux closure through several dots which could be visualized with micromagnetic simulations. Further evidence of the stray field interactions was seen in photoemission electron microscopy images, where bands of contrast corresponding to chains of coupled dots were observed.
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