Abstract
AbstractPatterned semiconductors are essential for the fabrication of nearly all electronic devices. Over the last two decades, semiconducting polymers (SPs) have received enormous attention due to their potential for creating low‐cost flexible electronic devices, while development of scalable patterning methods capable of producing sub‐μm feature sizes has lagged. A novel method for patterning SPs termed Projection Photothermal Lithography (PPL) is presented. A lab scale PPL microscope is built and it is demonstrated that rapid (≈4 cm2 h−1) and large single exposure area (≈0.69 mm2) sub‐μm patterns can be obtained optically. Polymer domains are selectively removed via a photo‐induced temperature gradient that enables dissolution. It is hypothesized that commercial‐scale patterning with a throughput of ≈5 m2 h−1 and resolution of <1 μm could be realized through optimization of optical components.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
