Abstract
Scanning probe lithography technology is mainly used the electrical, mechanical or thermal interaction between the atomic force microscope tip and substrate to perform imaging, manipulation and modification of the nanoscale surface. It is a simple, rapid and accurate nanostructure preparation technique. The scanning probe oxidation lithography technology has a good prospect, using highly localized water bridge formed between the tip and the sample surface to prepare micro-nano scale structures on material surface through electrochemical reactions. It has been widely used to produce nano-scale functionalized patterns and micro-nano devices. The mechanism of the patterning process and influencing factors such as voltage, tip-sample force, duration, relative humidity, and scanning speed are described in detail in this paper. Then, the work on the preparation of micro-nano devices using this technology is summarized. Finally, we discussed the advantages and problems of this technology, as well as the potential solution and development of it.
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