Abstract
A versatile analytical system based on thermal desorption spectroscopy of thin films is presented. We have found the apparatus to be a useful tool for measuring the desorption characteristics of trapped gases in physical vapor deposited thin films and in determining the thermal stability of multi-component thin film compounds and multilayer structures. The system was also found to be a convenient tool for determining outgassing properties of thin film and thick film materials for vacuum microelectronic device applications.
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