Abstract
The coverage of bright platinum electrodes with formic acid molecules, oxygen atoms, and hydrogen atoms was determined as a function of potential and bulk concentration of formic acid in 1 N HClO4 during anodic and cathodic low-speed potential sweeps in the potential range between hydrogen and oxygen evolution. Anodic and cathodic charging curves were used. The techniques are discussed. The coverage with formic acid increases continuously below +0·4 V during the cathodic sweep and below +0·4 V during the anodic sweep. It decreases with increasing potential above 0·5 V and finally becomes negligibly small during the anodic sweep. The formation of the oxygen layer is slightly hindered in the presence of formic acid and starts at more anodic potentials than in 1 N HClO4. Hydrogen adsorption is decreased by about 75 per cent if a monolayer of formic acid molecules is present.
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