Abstract

The resistance of thin diamondlike carbon (DLC) films to anodic breakdown in aqueous electrolytes was investigated using voltammetry. The films were less than 0.5 μm thick and were deposited on type 301 stainless steel substrates using plasma-assisted chemical vapor deposition (PACVD) from either methane, acetylene, or 1,3-butadiene precursors with argon or hydrogen as diluent. A 10 nm thick polysilicon (PS) film was plasma-deposited prior to DLC film deposition to improve adhesion. The electrolytes used for corrosion testing were mixtures of 0.1 M NaCl and 0.1 M Na2SO4 and 0.1 M HCl and 0.1 M Na2SO4 in de-ionized water. The measured anodic current was lowest for the films deposited from butadiene and highest for those deposited from methane. The anodic current also increased with an increase in the hydrogen content in the feed gas mixture. In addition, the DLC films deposited at higher gas flow rates offered more resistance to anodic dissolution than those deposited at lower gas flow rates. Annealing improved the film performance. There appears to be an optimum DLC film thickness which provides the maximum resistance to anodic dissolution. In the best case, the DLC films reduced the anodic dissolution of bare stainless steel by about 4 orders of magnitude in the passive region. Atomic force microscopy studies of coated and uncoated stainless steel showed that the DLC films conformed to the steel substrate surface and had no effect on surface roughness, while DLC coated silicon substrates showed no evidence of pores.

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