Anisotropic defect distribution in He+-irradiated 4H-SiC: Effect of stress on defect distribution

Abstract

Irradiation-induced anisotropic swelling in hexagonal α-SiC is known to degrade the mechanical properties of SiC; however, the associated physical mechanism and microstructural process remain insufficiently understood. In this study, an anisotropic swelling condition where the surface normal direction was allowed to freely expand with constraint in the lateral direction was introduced in 4H-SiC using selected-area He+ irradiation, and the internal defect distribution was investigated using transmission electron microscopy (TEM) and advanced scanning TEM. The defect distribution was compared to that in non-selected-area He+-irradiated 4H-SiC and electron-irradiated TEM-foil 4H-SiC. An anisotropic defect distribution was observed in the selected-area He+-ion-irradiated 4H-SiC, with interstitial defects preferentially redistributed in the surface normal direction ([0004]) and negative volume defects (such as vacancies and/or carbon antisite defects) dominantly located in the lateral directions ([112¯0] and [101¯0]). This anisotropy of the defect distribution was substantially lower in the non-selected-area He+-irradiated and electron-irradiated samples. The stress condition in the three samples was also measured and analyzed. In the selected-area He+-irradiated 4H-SiC, compressive stress was introduced in the lateral directions (([101¯0] and [112¯0])), with little stress introduced in the surface normal direction ([0004]); this stress condition was introduced at the beginning of ion irradiation. The compressive stress likely inhibits the formation of interstitial defects in the lateral directions, enhancing the anisotropy of the defect distribution in SiC.