Analysis of thin film surface barrier solar cells with a microrelief interface

Abstract

The influence of a microrelief interface between a thin conductive film (emitter) and a semiconductor substrate (absorber) on the optical and recombination losses in surface barrier solar cells is analyzed. Equations for the calculation of monochromatic light transmission through a thin absorbing film with one or two rough surfaces, on an absorbing substrate, are presented. For a weakly texturized interface and a normal direction of the incident light, the influence of the microroughness is taken into account by the formulae obtained. A model of patches with microsurfaces parallel to the structure surface and ones inclined to it at a certain angle (the most probable statistically) was used to describe the experimental results. Au/GaAs surface barrier structures with interface microrelief of a quasigrating or a dendritic type, obtained by chemical anisotropic etching of GaAs, were investigated. The geometric and statistical parameters of the microrelief were determined by atomic force microscopy techniques. The recombination parameters of the textured interfaces were determined from the experimental spectra of the external quantum efficiency, taking into consideration the calculated spectra of light transmittance. A comparison of the internal quantum efficiency spectra with the calculated ones allows a determination of the electronic parameters of the interface. Both the photoconversion parameters under AM0 simulated illumination and the tolerance for 60Co γ-irradiation, obtained for structures with various interface microrelief morphologies, allowed identification of microrelief of the quasigrating type as more suitable for solar cell applications.