Abstract
In this paper, an extended state observer (ESO)-based run to run (RtR) controller is presented to suppress various stochastic disturbances emerging in the semiconductor manufacturing process. Using the internal model control theory, the relationship between the ESO-RtR controller and the exponentially weighted moving average (EWMA) controller, and the relationship between the ESO-RtR controller and double EWMA controller are discussed. The stable region of the proposed ESO-RtR controller is calculated and discussed by using the Jury’s test. Furthermore, the ESO-RtR controller is extended to a nonlinear form (i.e., nonlinear ESO-RtR controller) to improve its disturbance compensation capability. Finally, numerical simulations and an industrial example are provided to demonstrate the effectiveness of the proposed algorithm.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
