Abstract
A 150 keV ion implanter has been completed and put into operation in the Department of Electronics of the Faculty of Nuclear Science and Physical Engineering in Prague. The equipment consists of an duoplasmatron ion source with post-ionisation, sometimes called triplasmatron, a one-gap accelerator, a magnet mass separator and a target chamber in which the ion beam is scanned sind deflected electrostatically to avoid neutral beam to reach the target. The pumping system consists of an oil diffusion pump, a turbomolecular pump and an ion- -sputter pump at the target chamber. All parts of the vacuum system are made of stainless steel, copper gaskets are used everywhere except of ion source, target chamber can be heated to 400°C. Differential pumping is used and the vacuum in the target chamber is in the 10-8 Torr range. The ion beam will also be usee for surface composition or depth profile measurements with a SIMS system which is being built.
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