Abstract
Density functional theory was used to predict the diffusion and precipitation of Cr in Cu. The energy barrier of Cr diffusion in Cu is comparable to the self-diffusion of Cr, and higher than the energy barrier of Cu self-diffusion. The simulations support the experimentally measured hardness of 30nm thick nanolaminate layers of Cr/Cu-3.4%Cr. As-deposited films had a hardness of 6.25GPa; annealing at 373K decreased hardness to 5.95GPa, while annealing at 573K increased the hardness to 6.6GPa. Transmission electron microscopy indicates there is significant local strain due to precipitation, in agreement with theoretical predictions.
Sign-in/Register to access full text options 
Talk to us
Join us for a 30 min session where you can share your feedback and ask us any queries you have
Schedule a callDisclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.
