低能离子束诱导Ag表面纳米金字塔微结构

Abstract

Ion beam sputtering induced experimental method was used to assist the silver film deposition on monocrystalline silicon(100)and the induced deposition effects of low energy Ar+ion beams was discussed with different ion energies,fluxes and substrate temperatures at the ion incidence angle of 30°.The experiment indicated that temperature change had significant influence on the nano microstructure size and roughness.When the substrate temperature was between 32℃ and 100℃,the closely packed nano pyramid microstructures were obtained with grains consistent in size;when the substrate temperature rose between 32℃and 200℃,the microstructures transverse size(λc)of samples increased rapidly,but the roughness decreased at first(32~100℃),and then increased rapidly(100~200℃).When ion flux density was within 15~45μA/cm2 with an ion beam energy of 1 400eV,the increase of ion beam flux densities at the same deposition temperature could achieve the nano crystal grains with unchanged lateral sizes and more compact arrangement,and slightly increased roughness;when ion beam energy was within 1 000~1 800eV with an ion beam flux of 15μA/cm2,the increase of ion beam energies could lead silver nano microstructure sizes to increase,and the surface roughness of samples to increase first and then decrease slowly.The pattern transformation of self-organizing nano-structure results from the interaction of spurting roughening and relaxation mechanism.