Abstract
We use X-ray absorption fine structure (XAFS) spectroscopy at the Si K-edge and the Ag L3,2-edge to monitor the surface chemistry of silicon nanowires. We found that Si nanowires prepared by laser ablation and thermal evaporation are coated with a thick layer of oxides that can be readily removed with a HF solution. HF-refreshed silicon nanowires become a moderate reducing agent and can be used as a nanostructure template upon which silver nanoaggregate deposited reductively from a Ag+ aqueous solution, reoxidizing the surface in the process. These results are compared with those of porous silicon.
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