Abstract

Abstract An atomic force microscope (AFM) was used to measure the interactions between a flat Teflon AF™ surface and an α-alumina or amorphous silica sphere in cyclohexane as a function of distance of separation. Repulsive van der Waals (vdW) forces were predicted for the interactions between Teflon AF™ and α-alumina or amorphous silica according to the negative Hamaker constants, which were calculated from the dielectric response functions of materials using the Lifshitz theory. The measured forces agree well with the theoretically calculated forces, which include the retardation contribution. The retardation effects are apparent at large distance of separation (>4–5 nm) where the measured forces are weaker than the non-retarded prediction.

Full Text
Paper version not known

Talk to us

Join us for a 30 min session where you can share your feedback and ask us any queries you have

Schedule a call

Disclaimer: All third-party content on this website/platform is and will remain the property of their respective owners and is provided on "as is" basis without any warranties, express or implied. Use of third-party content does not indicate any affiliation, sponsorship with or endorsement by them. Any references to third-party content is to identify the corresponding services and shall be considered fair use under The CopyrightLaw.